Home » Tender for Open Procedure For The Awarding Of The Supply And Installation Of An Atomic Layer Deposition (ald) System In Thermal Version, Intended For The Growth Of Oxides, Nitrides, And Metal Derivatives On Silicon Substrates And Other Compatible Materials, Using Th, Italy

Tender Notice

Tender TI Ref No :

526938300

Tender Date :

01 Jan 2026

Tender Description :

Tender for Open Procedure For The Awarding Of The Supply And Installation Of An Atomic Layer Deposition (ald) System In Thermal Version, Intended For The Growth Of Oxides, Nitrides, And Metal Derivatives On Silicon Substrates And Other Compatible Materials, Using Th

Tender Deadline :

31 Jan 2026

Tender Project Location :

Italy

Tender Sector :

IT - Hardware Tenders

Tender CPV :

Microelectronic machinery and apparatus Tenders

Tender Estimated Cost :

20.00 Million

Tender Document Type :

Tender Notice

Tender Organization Name :

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Tender Original Document :

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Tender Funding Agency :

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